[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-7] The Small HIPIMS Plasma Source and the Application for Minimal Fab

^○Hisato Ogiso^1,2, Shizuka Nanano^1,2, Ken Yukimura¹, Akihiko Kato^2,3, Yuki Yabuta^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, Minimal², Seinan³)

Keywords:HIPMS,Minimal Fab