[18p-D1-1~17] 6.2 Carbon-based thin films

[18p-D1-1] The effect of O₂ plasma asshing after carbon layers formation at Ti/n-type diamond interface

^○(DC)Tsubasa Matsumoto^1,2,3, Kazuya Shirota^1,2,3, Hiromitsu Kato^2,3, Norio Tokuda^2,3,4, Daisuke Takeuchi^2,3, Toshiharu Makino^2,3, Masahiko Ogura^2,3, Hideyo Okushi^2,3, Satoshi Yamasaki^1,2,3 (University of Tsukuba¹, AIST², CREST c/o AIST³, Kanazawa University⁴)

Keywords:接触抵抗,ダイヤモンド