The 74th JSAP Autumn Meeting,2013

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13. Semiconductors A (Silicon) » 13.3 Insulator technology

[18p-P9-1~10] 13.3 Insulator technology

Wed. Sep 18, 2013 1:30 PM - 3:30 PM P9 (Davis Memorial Auditorium)

1:30 PM - 3:30 PM

[18p-P9-9] Healing of defect in SiO2 film resulting from stress

○yusuke takigaura1, ryu hasunuma1, kikuo yamabe1 (Tsukuba Univ.1)

Keywords:ストレス印加,欠陥の回復