The 74th JSAP Autumn Meeting,2013

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

[19p-B4-1~21] 13.5 Si process technology

Thu. Sep 19, 2013 1:30 PM - 7:00 PM B4 (TC2 1F-106)

6:15 PM - 6:30 PM

[19p-B4-19] By-Product Formation Behavior in Silicon Epitaxial Growth from Chlorosilane Gas

Ayumi Sakurai1, Hitoshi Habuka1 (Yokohama Nat. Univ.1)

Keywords:Silicon epitaxy