[20a-B4-1~11] 13.5 Si process technology

[20a-B4-11] Quick Thermal Oxidation Process using Minimal Resistance Furnace

^○Shinnosuke Suzuki^1,2, Ayami Yaginuma^1,2, Kiyohiko Morikawa^1,2, Masashi Hattori^1,2, katsuhiko Nakato², Takanori Mikahara², Ikeda Shinichi^2,3, Sommawan Khumpuang^2,3, Shiro Hara^2,3 (KOYO Thermo Systems¹, MINIMAL², AIST³)

Keywords:半導体,ミニマル,シリコン