[20a-B4-1~11] 13.5 Si process technology

[20a-B4-7] Mechanism of Thermal Oxidation Process using the Minimal Laser Heating Equipment

^○Haruki Toonoe², Takashi Yajima², Takashi Chiba^1,2, Masao Terada^1,2, Shinichi Ikeda^2,3, Sommawan Khumpuang^2,3, Shiro Hara^2,3 (Sakaguchi E.H VOC Corp¹, Minimal², AIST³)

Keywords:ミニマルファブ,酸化,Minimal