[20a-B4-1~11] 13.5 Si process technology

[20a-B4-8] Control of the Uniformity of Lithography Resolution in Minimal Mask-less Exposure System.

^○Yuuji Kitayama¹, Haruki Toonoe¹, Yoshie Ishii^1,2, Ryouichi Irita^1,2, Kenji Miyake^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (MINIMAL¹, PMT², AIST³)

Keywords:ミニマルファブ,マスクレス,リソグラフィー