[20p-D7-1~8] 14.3 Electron devices and Process technology

[20p-D7-3] Annealing Temperture Dependent Contact Resistance of TiC Electrodes on AlGaN/GaN

^○Yoshihiro Matsukawa¹, Mari Okamoto¹, Kuniyuki Kakushima², Yoshinori Kataoka², Akira Nishiyama², Nobuyuki Sugii², Hitoshi Wakabayashi², Kazuo Tsutsui¹, Wataru Saito³, Hiroshi Iwai¹, Kenji Natori¹ (Tokyo Tech. FRC¹, IGSSE², Toshiba corp.³)

Keywords:AlGaN/GaN,コンタクト抵抗,TiC