Session information

Regular sessions(Poster presentation)

08. Plasma Electronics » 8. Plasma Electronics

[29p-PA1-1~17] 8. Plasma Electronics

Fri. Mar 29, 2013 1:30 PM - 3:30 PM PA1 (1st gymnasium)

Poster Session 13:30〜15:30(PA)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[29p-PA1-1] Production of line-shaped plasma for improvement of material target utilization (8.3)

^○Yasunori Ohtsu¹, Yuuki Matsumoto¹, Morito Akiyama², Tatsuo Tabaru² (Saga Univ.¹, AIST MSRC²)

[29p-PA1-2] Characteristics of Sputtering Deposition Processing Plasma using Powder Target (8.3)

^○Hiroharu Kawasaki¹, Dasichi Taniyama¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Yuki Tanaka¹, Yoshiaki Suda¹ (Sasebo Nat'l Col. Tech.¹)

[29p-PA1-3] Deposition of Al doped ZnO Films by RF superimposed Magnetron Sputtering (8.3)

^○Yoshinobu Matsuda¹, Daichi Matsuoka¹, Takato Nakashima¹, Koji Yamamoto¹, Masanori Shinohara¹ (Nagasaki Univ.¹)

[29p-PA1-4] Dependence of Photoluminescence from a-Si Films fabricated by TEOS on Composition (8.3)

^○Kohei Higashiyama¹, Eri Takeda², Isamu Kato³ (Waseda Univ.¹, Waseda Univ.², Waseda Univ.³)

[29p-PA1-5] Plasma Generation by Multipurpose Microwave Antenna and Its Application to Silicon Thin Film Deposition (8.3)

^○Shogo Kondo¹, Suguru Nakano¹, Hirotaka Toyoda^1,2 (Nagoya Univ.¹, Nagoya Univ.²)

[29p-PA1-6] Silicon cluster volume fraction of silicon thin films prepared by multi-hollow plasma discharge CVD (8.3)

^○Yeonwon Kim¹, Kosuke Hatozaki¹, Yuji Hashimoto¹, Hyunwoong Seo¹, Kunihiro Kamataki¹, Giichiro Uchida¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (kyushu university¹)

[29p-PA1-7] Characterization of Fluorinated Amorphous Carbon Films Fabricated by Low-energy Electron Beam Irradiation on c-C₄F₈ Solid Thin Films Condensed at Cryogenic Temper (8.3)

^○Haruka Soga¹, Kenzi Wako¹, Ryuutarou Yamada¹, Xuebing Hu¹, Tetuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

[29p-PA1-8] Improvement of Hydrophilicity of Carbon Nano Tubes with Pulsed Plasma Treatment (8.3)

^○Keiji Nakamurar¹, Naoya Esaka¹, Kazuyoshi Ohshita¹, Shunsaku Kikuchi¹, Shunpei Yamashita¹, Kunihiko Yoshida¹ (Chubu Univ.¹)

[29p-PA1-9] ▲Adsorption of Cesium Ions from Aqueous Solution by O2-Plasma-Oxidized Multiwalled Carbon Nanotubes/Iron Oxides (8.3)

^○（D）Shubin Yang^1,2, Xiangke Wang², Masaaki Nagatsu¹ (Graduate School of Science and Technology, Shizuoka Univ.¹, Institute of Plasma Physics, Chinese Academy of Sciences²)

[29p-PA1-10] ▼Characterization of plasma functionalized ZnO nanoparticles (8.3)

^○Mihai Alexandru Ciolan^1,3, Iuliana Motrescu², Dumitru Luca³, Masaaki Nagatsu¹ (GRADUATE SCHOOL OF SCIENCE AND TECHNOLOGY, SHIZUOKA UNIVERSITY¹, RESEARCH INSTITUTE OF ELECTRONICS, SHIZUOKA UNIVERSITY², DEPARTMENT OF PHYSICS, "AL.I.CUZA" UNIVERSITY³)

[29p-PA1-11] ▼Nitrogen Plasma Modification of Amino Acids with or without ZnO Nanoparticles (8.4)

^○Iuliana Motrescu¹, Mihai Alexandru Ciolan^2,3, Dumitru Luca³, Masaaki Nagatsu² (Research Institute of Electronics, Shizuoka University¹, Graduate School of Science And Technology, Shizuoka University², Department of Physics, "Al.I.Cuza" University³)

[29p-PA1-12] Analysis on Physical and Chemical Reaction on the Electrodes in Solution Plasma (8.4)

^○YongKang Heo¹, Maria Antoaneta Bratescu¹, Nagahiro Saito^1,2,3 (Nagoya Univ.¹, Nagoya Univ. Eco Topia², Nagoya Univ. Green Vehicle³)

[29p-PA1-13] Deep Dry Etching of Al-rich AlGaAs for Photonic Crystal Fabrication (2) (8.4)

^○（B）Kentarou Hashimura¹ (Osaka University¹)

[29p-PA1-14] N2 Plasma Etching Damage on n-GaN Surface (8.4)

^○Masahito Niibe¹, Retsuo Kawakami², Yoshitaka Nakano³, Masashi Konishi², Yuta Mori², Takuya Kotaka¹, Tatsuo Shirahama², Tetsuya Yamada², Kikuo Tominaga², Takashi Mukai⁴ (Univ. Hyogo¹, Univ. Tokushima², Chubu Univ.³, Nichia Corp.⁴)

[29p-PA1-15] H2 Plasma Cleaning of a-Si film by using pulse power supply (8.4)

^○Kenji Hashimoto¹, Shinji Yasui¹, Toshiki Manabe², Kunihiko Koike² (Nagoya Inst. Tec.¹, Iwatani Corp.²)

[29p-PA1-16] ▲Plasma Surface Modification with Functional Groups of Graphite Encapsulated Gold Nanoparticles Prepared by DC Arc Discharge (8.5)

^○（D）Enbo Yang¹, Shun Tsumura², Kosuke Kawamura², Masaaki Nagatsu^1,2 (Graduate School of Science and Technology, Shizuoka Univ.¹, Graduate School of Engineering, Shizuoka Univ.²)

[29p-PA1-17] △effect of water-alcohol solvent on synthesis of gold nano particle by solution plasma (8.5)

^○Tomohito Sudare¹, Tomonaga Ueno^1,2, Nagahiro Saito^1,2,3 (Nagoya Univ.¹, Green Mobility Collaborative Research Center, Nagoya Univ.², Eco Topia Science Institute, Nagoya Univ.³)

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