[27a-G10-1~3] Semiconductor modeling and simulation: today and tomorrow

[27a-G10-2] Modeling of electrical resistance in nanoscale metallic wires: A Monte Carlo approach

^○Takashi Kurusu¹, Hiroyoshi Tanimoto¹, Makoto Wada¹, Atsunobu Isobayashi¹, Akihiro Kajita¹, Nobutoshi Aoki¹, Yoshiaki Toyoshima¹ (Toshiba S&S Company¹)

Keywords:モンテカルロ法、電気抵抗率の細線効果、Line-Edge Roughness