The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.4 Plasma etching

[27p-A3-1~17] 8.4 Plasma etching

Wed. Mar 27, 2013 1:30 PM - 6:00 PM A3 (K1 2F-201)

[27p-A3-1] Effect of Mask Line-Edge-Roughness on Wiggling

Naoyuki Kofuji1, Nobuyuki Negishi1, Hiroaki Ishimura2, Toshiaki Nishida2, Hitoshi Kobayashi2 (Hitachi CRL1, Hitachi High-Tech2)

Keywords:LER、Wiggling