[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-13] △Molecular Dynamics Simulation of Si Surface Oxidation Processes by Oxygen Gas cluster Ion Beams.

^○（D）Kohei Mizotani¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (Osaka Univ.¹)

Keywords:ガスクラスタービーム