The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.4 Plasma etching

[27p-A3-1~17] 8.4 Plasma etching

Wed. Mar 27, 2013 1:30 PM - 6:00 PM A3 (K1 2F-201)

[27p-A3-15] △Mechanism of Generating Active Species and Etch Reaction in CHxFy Plasma (II)

Yusuke Kondo1, Yudai Miyawaki1, Keigo Takeda1, Hiroki Kondo1, Kenji Ishikawa1, Toshio Hayashi1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)

Keywords:Fluorocarbon、Model