[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-17] Surface roughness of ArF photoresist irradiated plasma processes

Takuya Takeuchi¹, ^○Kenji Ishikawa¹, Yuchi Setsuhara², Keigo Takeda¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹, Osaka Univ.²)

Keywords:ArFレジスト、エッチング