[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-3] Behavior of Br radical in HBr inductively coupled plasma

^○Daiki Iino¹, Yasuhiro Nojiri¹, Keiji Suzuki¹, Takumi Oike², Yoshitaka Fujii², Hirotaka Toyoda^2,3 (Corporate Manufacturing Engineering Center, Toshiba¹, Nagoya Univ.², PLANT, Nagoya Univ.³)

Keywords:HBrプラズマ、ラジカル