[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-6] In-Situ Scanning Tunneling Microscopy of Low-Energy Ion Induced Damage Utilizing Shadowing Effect

^○（B）Kotaro Mura¹, Takefumi Kamioka^1,2, Fumiya Isono^1,2, Yuji Kawamura^1,2, Yasuhiro Shikahama^1,2, Hiroki Yamashita^1,2, Kohei Yamada¹, Hiroki Kosugiyama¹, Shuichiro Hashimoto¹, Takanobu Watanabe^1,2 (Waseda Univ.¹, JST-CREST²)

Keywords:シャドーイング効果、イオン注入、scanning tunneling microscope