[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-9] Molecular Dynamics Analysis of Surface Reaction Kinetics in Si etching by HBr Plasmas

^○Nobuya Nakazaki¹, Hirotaka Tsuda¹, Yoshinori Takao¹, Koji Eriguchi¹, Kouichi Ono¹ (Kyoto Univ.¹)

Keywords:分子動力学法、HBrプラズマ