[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-11] ▼Study on mechanism of gallium nitride growth employing a plasma-enhanced metal-organic chemical vapor deposition

^○（D）Yi Lu¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:PECVD、gallium nitride