[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-16] △Development of Resist removal process using microwave excited bubble plasma under water

^○Kouhei Nosaka¹, Tatsuo Ishijima¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹, Hideo Horibe², Yosuke Goto² (Kanazawa University¹, Kanazawa Institute of technology²)

Keywords:水中プラズマ、レジスト膜除去