[27p-G10-1~6] Semiconductor modeling and simulation: today and tomorrow

[27p-G10-2] Atomistic modeling of dopant diffusion in SiGe-channel using Kinetic MC method

^○Taiji Noda¹, Wilfried Vandervorst^{2, 3} (Panasonic Corp.¹, IMEC², K. U. Leuven³)

Keywords:半導体、シミュレーション、kinetic Monte Carlo