[27p-PB4-1~16] 13.5 Si process technology

[27p-PB4-5] Epitaxial Process Developments towards Ultra-Small Germanium Photodetectors

^○Makoto Miura^1,2, Junichi Fujikata^1,2, Masataka Noguchi^1,2, Tsuyoshi Horikawa^1,3, Yasuhiko Arakawa^1,4 (PECST¹, PETRA², AIST³, IIS, Univ. Tokyo⁴)

Keywords:ゲルマニウム、受光器、エピタキシャル成長