The 60th JSAP Spring Meeting,2013

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Regular sessions(Poster presentation)

13. Semiconductors A (Silicon) » 13.5 Si process technology

[27p-PB4-1~16] 13.5 Si process technology

Wed. Mar 27, 2013 1:30 PM - 3:30 PM PB4 (2nd gymnasium)

[27p-PB4-8] Development of Al Damage-less Insulating Film Etchant

○Tsuguhiro Tago1,2, Kunio Ichino2, Mayumi Kimura1, Atsushi Matsui1 (HAYASHI PURE CHEMICAL IND.,LTD1, Graduate School of Engineering, Tottori University2)

Keywords:Alダメージレス絶縁膜エッチング剤、エッチング剤