[28a-A5-1~6] 8.4 Plasma etching

[28a-A5-4] Shape Simulation for Neutral Beam Etching (4)

^○Shunsuke Mochizuki¹, Naoki Watanabe², Shingo Ohtsuka², Takuya Iwasaki², Kohei Ono², Yasuroh Iriye², Kazuhiro Miwa³, Tomohiro Kubota^3,4, Masakazu Sugiyama^3,5, Seiji Samukawa^3,4 (Mathematical Systems Inc.¹, Mizuho Information & Research Institute Inc.², BEANS Project³, Tohoku Univ.⁴, Univ. of Tokyo⁵)

Keywords:中性粒子ビームエッチング