[28a-A5-1~6] 8.4 Plasma etching

[28a-A5-6] ▲In situ Surface analysis of GaAs irradiated by Cl plasma beams

^○Jongyun Park¹, Takuya Takeuchi¹, Kenji Ishikawa¹, Yuichi Setsuhara², Keigo Takeda¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹, Osaka Univ.²)

Keywords:GaAs