[28a-G11-1~9] 14.3 Electron devices and Process technology

[28a-G11-1] Wet cleaning of GaN surfaces using functional water

^○Yukihiro Tsuji^1,2, Kenichi Nakamura^1,2, Isao Makabe¹, Ken Nakata¹, Tsukuru Katsuyama¹, Akinobu Teramoto², Yasuyuki Shirai², Shigetoshi Sugawa², Tadahiro Ohmi² (Sumitomo Electric Industries, LTD.¹, Tohoku University²)

Keywords:窒化ガリウム