△Considering of Mechanism of Stabilization of cubic-phase HfO2 at Room Temperature

Presentation information

Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.3 Insulator technology

Thu. Mar 28, 2013 10:00 AM - 1:15 PM G2 (B5 1F-2102)

^○Takamasa Iwai¹, Takeaki Yajima¹, Tomonori Nishimura¹, Kousuke Nagashio¹, Akira Toriumi¹ (Univ. of Tokyo¹)

Keywords:HfO2、High-k、相変態