[28p-B2-1~13] 7.3 Lithography

[28p-B2-13] △Development of Micro Coherent EUV Scatterometry Microscope for EUV Mask Defect Characterization

^○Yusuke Tanaka¹, Tetsuo Harada¹, Takeo Watanabe¹, Youichi Usui², Hiroo Kinoshita¹ (Univ. of Hyogo¹, EIDEC²)

Keywords:EUV、CSM、マスク検査