Regular sessions(Oral presentation)

[28p-B2-1~13] 7.3 Lithography

Thu. Mar 28, 2013 1:30 PM - 5:00 PM B2 (K2 3F-1302)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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[28p-B2-1] Ultra-Long Overhang Structure Growth by Real-Time Feedback Dose Control of Focused-Ion-Beam

^○Dengji Guo¹, Reo Kometani¹, Shin'ichi Warisawa¹, Sunao Ishihara¹ (The Univ. of Tokyo¹)

[28p-B2-2] Etching from the Side of Si Block and Creating Three-Dimensional Nanostructure (2)

^○Kenji Yamazaki¹, Hiroshi Yamaguchi¹ (NTT Basic Research Labs.¹)

[28p-B2-3] Aberration-Collection of Electron Optics for Massively Parallel EB Lithography

^○Akira Kojima^1,2, Naokatu Ikegami², Takashi Yoshida³, Hiroshi Miyaguchi³, Hideyuki Ohyi¹, Nobuyoshi Koshida², Masayoshi Esashi³ (Crestec Co.¹, Tokyo Univ. A&T², Tohoku Univ.³)

[28p-B2-4] Problem Solving of Directional Pattern Width Difference in Projection Exposure Using a Four-Line Gradient Index Lens Array

^○Toshiyuki Horiuchi¹, Takeru Suzuki¹, Hiroshi Kobayashi¹ (Tokyo Denki Univ.¹)

[28p-B2-5] Development of Optical Lithography Process for Blazed Diffraction Grating

^○Kazuyuki Kakuta¹, Daisaku Sugi¹, Shigeru Matsui², Yoshisada Ebata², Tetsuya Watanabe², Norio Hasegawa² (Hitachi, Ltd., Micro Device Division¹, Hitachi High-Technologies corp.²)

[28p-B2-6] The development of spectrum tuning technology in 90W ArF excimer laser

^○Kaname Imokawa¹, Takahito Kumazaki¹, Yoshinobu Watabe¹, Hiroaki Tsushima¹, Koji Kakizaki¹, Akihiko Kurosu¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc.¹)

[28p-B2-7] Development of high power ArF excimer laser(120W) for semiconductor lithography tools(Ⅱ)

^○takashi Miyata¹, Youichi Sasaki¹, Takeshi Aasayama¹, Hiroyuki Masuda¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc¹)

[28p-B2-7.1] Break(15min)

[28p-B2-8] △The relationship between esterification rate of photo-active compounds and lithographic properties of the positive-tone novolak resists

^○Seji Saito¹, Takuya Matsuda¹, Keita Ishiguro¹, Seiji Takahashi¹, Akihiko Kono¹, Sekiguchi Atsushi², Katsuto Taniguchi³, Hatsuyuki Tanaka³, Hideo Horibe¹ (Kanazawa Institute of Technology¹, Litho Tech Japan Co.², AZ Electronic Materials K.K.³)

[28p-B2-9] The mitigation of the development of the high sensitive EUV resist

^○Takeo Watanabe¹, Kazuya Emura¹, Daiju Shiono², Yuichi Haruyama¹, katsumi Ohmori², Kazufumi Sato², Testuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

[28p-B2-10] ▲In situ Observation of Photoresist Dissolution 5

^○JuliusJoseph Santillan¹, Toshiro Itani¹ (EIDEC¹)

[28p-B2-11] Development of coherent 13 nm high-order harmonics for ultra-fine structure metrology V

^○Yutaka Nagata^1,2,3, Tetsuo Harada^2,3, Masato Nakasuji², Hiroo Kinoshita^1,2,3, Katsumi Midorikawa¹ (RIKEN ASI¹, Univ. of Hyogo², JST CREST³)

[28p-B2-12] Pattern defect observation result using coherent EUV scatterometry microscope with high-order harmonic generation source

^○Masato Nakasuji^1,3, Masaki Kuki^1,3, Tetsuo Harada^1,3, Yutaka Nagata^2,3, Takeo Watanabe^1,3, Katsumi Midorikawa², Hiroo Kinoshita^1,3 (Univ. of Hyogo¹, RIKEN², CREST-JST³)

[28p-B2-13] △Development of Micro Coherent EUV Scatterometry Microscope for EUV Mask Defect Characterization

^○Yusuke Tanaka¹, Tetsuo Harada¹, Takeo Watanabe¹, Youichi Usui², Hiroo Kinoshita¹ (Univ. of Hyogo¹, EIDEC²)

Sessions

07. Beam Technology and Nanofabrication » 7.3 Lithography