[28p-B2-1~13] 7.3 Lithography

[28p-B2-8] △The relationship between esterification rate of photo-active compounds and lithographic properties of the positive-tone novolak resists

^○Seji Saito¹, Takuya Matsuda¹, Keita Ishiguro¹, Seiji Takahashi¹, Akihiko Kono¹, Sekiguchi Atsushi², Katsuto Taniguchi³, Hatsuyuki Tanaka³, Hideo Horibe¹ (Kanazawa Institute of Technology¹, Litho Tech Japan Co.², AZ Electronic Materials K.K.³)

Keywords:lithographic properties、novolak resists、esterification rate