[28p-B2-1~13] 7.3 Lithography

[28p-B2-4] Problem Solving of Directional Pattern Width Difference in Projection Exposure Using a Four-Line Gradient Index Lens Array

^○Toshiyuki Horiuchi¹, Takeru Suzuki¹, Hiroshi Kobayashi¹ (Tokyo Denki Univ.¹)

Keywords:屈折率分布型レンズアレイ、走査投影露光、異方性