[28p-B2-1~13] 7.3 Lithography

[28p-B2-7] Development of high power ArF excimer laser(120W) for semiconductor lithography tools(Ⅱ)

^○takashi Miyata¹, Youichi Sasaki¹, Takeshi Aasayama¹, Hiroyuki Masuda¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc¹)

Keywords:リソグラフィ、エキシマレーザ、lithography