[28p-B2-1~13] 7.3 Lithography

[28p-B2-12] Pattern defect observation result using coherent EUV scatterometry microscope with high-order harmonic generation source

^○Masato Nakasuji^1,3, Masaki Kuki^1,3, Tetsuo Harada^1,3, Yutaka Nagata^2,3, Takeo Watanabe^1,3, Katsumi Midorikawa², Hiroo Kinoshita^1,3 (Univ. of Hyogo¹, RIKEN², CREST-JST³)

Keywords:EUV、CSM、HHG-CSM