[28p-B2-1~13] 7.3 Lithography

[28p-B2-11] Development of coherent 13 nm high-order harmonics for ultra-fine structure metrology V

^○Yutaka Nagata^1,2,3, Tetsuo Harada^2,3, Masato Nakasuji², Hiroo Kinoshita^1,2,3, Katsumi Midorikawa¹ (RIKEN ASI¹, Univ. of Hyogo², JST CREST³)

Keywords:EUVリソグラフィ、コヒーレントEUV光、高次高調波