[28p-G19-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[28p-G19-15] Growth of Ta₂O₅/ZnO:In heterostructure Films by A New Facing-Target Sputtering Method and Its Application to High-Sensitive pH Sensors

^○（M1）Kazuya Mukai¹, Takayuki Onaka¹, Kazuto Koike¹, Toshihiko Maemoto¹, Shigehiko Sasa¹, Mitsuaki Yano¹, Sadao Kadokura², Yutaka Nakamitsu² (Osaka Inst. of Tech., NMRC¹, FTS Corp.²)

Keywords:ZnO、スパッタ法、ISFET