[29a-G7-1~11] 22.1Joint Session L "Basics and applications of MEMS, NEMS: Integration of diverse functionalities"

[29a-G7-3] Si Etching for Fabricating 3D MEMS Devices using Neutral Beam

^○Kazuhiro Miwa¹, shinji Ueki¹, Yuki Nishimori¹, Masakazu Sugiyama^1,2, Tomohiro Kubota^1,3, Seiji Samukawa^1,3, Gen Hashiguchi^1,4 (BEANS Labo.¹, Tokyo Univ.², Tohoku Univ.³, Shizuoka Univ.⁴)

Keywords:Si Etching、中性粒子、MEMS