[29p-B1-3] Formation of Inclined Sidewalls in Microchamber on Glass Chips
Keywords:非焦点紫外線露光、Si含有フォトレジスト、ガラス成形
Regular sessions(Oral presentation)
07. Beam Technology and Nanofabrication » 7.4 Nanoimprint
Fri. Mar 29, 2013 1:30 PM - 6:45 PM B1 (K2 3F-1301)
Keywords:非焦点紫外線露光、Si含有フォトレジスト、ガラス成形