The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[29p-B1-1~20] 7.4 Nanoimprint

Fri. Mar 29, 2013 1:30 PM - 6:45 PM B1 (K2 3F-1301)

[29p-B1-6] Selective Patterning of Fluorinated Self-assembled Monolayer by UV nanoimprinting

Hitomi Wakaba1,2, Makoto Okada1,2, Syuso Iyoshi1,2, Yuichi Haruyama1,2, Shinji Matsui1,2 (Univ.of Hyogo1, JST-CREST2)

Keywords:UVナノインプリント、フッ素系単分子膜