[29p-G16-1~21] 15.8 Crystal evaluation, nanoimpurities and crystal defects

[29p-G16-10] △First-Principles Analysis on Vacancy-Type Defects Introduced by Ion Implantation

^○Takahiro Maeta^1.2, Koji Sueoka¹, Koji Izunome² (Okayama Pref. Univ.,Dept. of System Engineering¹, GlobalWafers Japan Co., Ltd.²)

Keywords:第一原理、空孔型欠陥、イオン注入