[29p-G16-1~21] 15.8 Crystal evaluation, nanoimpurities and crystal defects

[29p-G16-12] In-Diffusion and Annealing of Nickel in Dislocation-Free n-Type Silicon

^○Shuji Tanaka¹, Seiji Takami¹, Takuya Mitoma¹, Koitirou Noguti¹ (Fukuoka Institute of Technology¹)

Keywords:電気的活性ニッケル原子、解離機構、空格子点の生成消滅