[29p-G19-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[29p-G19-7] △Fabrication and properties of IGZO thin films grown by mist CVD

^○Takayuki Uchida¹, Toshiyuki Kawaharamura², Mamoru Furuta², Masaru Sanada¹ (School of Sys. Eng., Kochi Univ. of Tech.¹, Inst. for Nanotechnology, Kochi Univ. of Tech.²)

Keywords:酸化インジウムガリウム亜鉛、ミスト化学気相成長法、薄膜