[30a-B3-1~12] 5.3 Optical Control

[30a-B3-2] SiOx Thin Film Deposited by RF-PECVD using TEOS Gas for Spot Size Converter Application

^○Hiroyuki Takahashi^1,2, Masashi Yamagishi^1,3, Naoki Hirayama^1,3, Shigeru Saitou^1,3, Yoshiji Noguchi^1,3, Tsuyoshi Horikawa^1,3 (PECST¹, PETRA², ICAN-AIST³)

Keywords:SiOx、SSC