[30a-F1-1~13] 6.4 New thin-film materials

[30a-F1-1] Optimization of the fabrication conditions of Y2O3/SiO2 and HfO2/SiO2 structures

^○（B）yuki Toyoshima¹, shota Taniwaki¹, Yasushi Hotta^1,3, Haruhiko Yoshida^1,3, Koji Arafune^1,3, Atsushi Ogura^2,3, Shinichi Sato^1,3 (Hyogo Univ.¹, Meiji Univ.², JST-CREST³)

Keywords:PLD、界面双極子、high-k材料