[30a-F1-1~13] 6.4 New thin-film materials

[30a-F1-4] Electrical properties of Al doped CeO2 thin films deposited by O2 introduced suputtering

^○Yuki Notani¹, Hiroki Kamata¹, Takuya Okazaki¹, Kenta Hara¹, Setu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei University¹, Comet Incorporated²)

Keywords:high-k、CeO2