In-situ ellipsometry of Cu thin film deposition process from supercritical fluids (3)

Presentation information

Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.4 Interconnection technology

Sat. Mar 30, 2013 9:00 AM - 12:00 PM G6 (B5 1F-2106)

^○Eiichi Kondoh¹, Ryota Gomi¹, Yukihiro Tamegai¹, Mitsuhiro Watanabe¹, Lianhua Jin¹ (Univ. Yamanashi¹)

Keywords:ellipsometry、超臨界流体