Co film of low resistivity formed by novel amidinate cobalt precursor

Presentation information

Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.4 Interconnection technology

Sat. Mar 30, 2013 1:30 PM - 3:00 PM G6 (B5 1F-2106)

^○Yumiko Kawano², Hideaki Machida¹, Masato Ishikawa¹, Hiroshi Sudoh¹, Kazutoshi Iwai², Yoshihiro Hirota² (Gas-phase Growth¹, Tokyo Electron²)

Keywords:cobalt、interconnect、CVD