Surface structure analysis of α-Ga2O3 film grown on α-Al2O3 by mist CVD using CAICISS

Daiki Tamba

Presentation information

Oral presentation

06. Thin Films and Surfaces » 6.5 Surface physics and vacuum

[17p-A6-1~8] 6.5 Surface physics and vacuum

Wed. Sep 17, 2014 1:30 PM - 3:45 PM A6 (E205)

1:45 PM - 2:00 PM

[17p-A6-2] Surface structure analysis of α-Ga₂O₃ film grown on α-Al₂O₃ by mist CVD using CAICISS

^○Daiki Tamba¹, Shun Osaka¹, Shouta Okasaka¹, Masaya Oda^2,3, Hiroshi Tabata¹, Osamu Kubo¹, Shizuo Fujita², Mitsuhiro Katayama¹ (Osaka Univ.¹, Kyoto Univ.², ROCA K. K.³)

Keywords:酸化ガリウム,CAICISS,CVD

« Previous in this session
Next in this session »

▲

Presentation information

[17p-A6-1~8] 6.5 Surface physics and vacuum

[17p-A6-2] Surface structure analysis of α-Ga2O3 film grown on α-Al2O3 by mist CVD using CAICISS

[17p-A6-2] Surface structure analysis of α-Ga₂O₃ film grown on α-Al₂O₃ by mist CVD using CAICISS