Influence of Sputtering Pressure on Surface Characteristics and Crystalline Quality of AlN Films Deposited by Pulsed DC Reactive Sputtering

Presentation information

Oral presentation

15. Crystal Engineering » 15.4 III-V-group nitride crystals

Wed. Sep 17, 2014 1:15 PM - 6:45 PM C5 (Open Hall)

5:45 PM - 6:00 PM

^○(M1)Hiroto Takeuchi¹, Makoto Ohtsuka¹, Hiroyuki Fukuyama¹ (Tohoku Univ. IMRAM¹)

Keywords:AlN,スパッタ