[18a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

[18a-A19-3] Delta doping of Bi in Si crystal with use of Bi nanoline as a dopant source: Reconsideration of anneal temperature

^○(M2)Takashi Kanazawa^1,2, Koichi Murata^1,2, Kohichi Nitto¹, Kazushi Miki^1,2 (NIMS¹, Univ. Tsukuba²)

Keywords:ドーピング,ナノ構造,シリコン