The 75th JSAP Autumn Meeting, 2014

Presentation information

Print

Oral presentation

13. Semiconductors A (Silicon) » 13.2 Insulator technology

[19a-A17-1~12] 13.2 Insulator technology

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A17 (E308)

9:15 AM - 9:30 AM

[19a-A17-2] Ferrolectric characteristics of HfO2 in Hf1-xZrxO2-HfO2 stack

○Tomonori Nishimura1, Takeaki Yajima1, Kosuke Nagashio1, Akira Toriumi1 (The Univ. of Tokyo1)

Keywords:強誘電体