Evidence for Si up-diffusion during scavenging of interfacial SiO2 in HfO2/SiO2/Si stack

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.2 Insulator technology

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A17 (E308)

9:00 AM - 9:15 AM

^○(D)Xiuyan Li¹, Takeaki Yajima¹, Tomonori Nishimura¹, Kousuke Nagashio¹, Akira Toriumi¹ (Univ. of Tokyo¹)

Keywords:SiO2 Scavenging,Si diffusion,SiO desorption